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For use in photonics, microelectronics, spintronics, or photovoltaics, an epitaxial wafer—also known as an epi wafer, epi-wafer, or epi-wafer—is a wafer of semiconducting material made by epitaxial growth. The epi layer can be made of the same material as the substrate, which is typically monocrystaline silicon, or it can be made of a more unusual material with particular desirable properties.
The first silicon epi wafers were created around 1966, and by the early 1980s, they had become widely used in industry. On monocrystalline silicon or other wafers, the Epitaxial Wafer Market can be grown using a variety of chemical vapour deposition (CVD) techniques, such as molecular beam epitaxy and atmospheric pressure CVD (APCVD) or metal organic chemical vapour deposition (MOCVD).
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